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Citation: K. Bergmann et al., Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency, APPL OPTICS, 39(22), 2000, pp. 3833-3837

Authors: Bergmann, K Schriever, G Rosier, O Muller, M Neff, W Lebert, R

Citation: K. Bergmann et al., Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma, APPL OPTICS, 38(25), 1999, pp. 5413-5417