Authors:
WANG W
FOSTER J
WENDT AE
BOOSKE JH
ONUOHA T
SANDSTROM PW
LIU H
GEARHART SS
HERSHKOWITZ N
Citation: W. Wang et al., MAGNETIC-FIELD-ENHANCED RF ARGON PLASMA FOR IONIZED SPUTTERING OF COPPER, Applied physics letters, 71(12), 1997, pp. 1622-1624