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Results: 1-25 | 26-26
Results: 1-25/26
NEW CRYSTAL-STRUCTURES OF WS2 - MICROTUBES, RIBBONS, AND ROPES
Authors: REMSKAR M SKRABA Z REGULA M BALLIF C SANJINES R LEVY F
Citation: M. Remskar et al., NEW CRYSTAL-STRUCTURES OF WS2 - MICROTUBES, RIBBONS, AND ROPES, Advanced materials, 10(3), 1998, pp. 246
MECHANICAL AND ELECTRICAL-PROPERTIES OF FCC TIO1-FILMS PREPARED BY RFREACTIVE SPUTTERING(X THIN)
Authors: BALLY AR HONES P SANJINES R SCHMID PE LEVY F
Citation: Ar. Bally et al., MECHANICAL AND ELECTRICAL-PROPERTIES OF FCC TIO1-FILMS PREPARED BY RFREACTIVE SPUTTERING(X THIN), Surface & coatings technology, 109(1-3), 1998, pp. 166-170
MOS2 MICROTUBES - AN ELECTRON-MICROSCOPY STUDY
Authors: REMSKAR M SKRABA Z CLETON F SANJINES R LEVY F
Citation: M. Remskar et al., MOS2 MICROTUBES - AN ELECTRON-MICROSCOPY STUDY, Surface review and letters, 5(1), 1998, pp. 423-426
HEXAGONAL NITRIDE COATINGS - ELECTRONIC AND MECHANICAL-PROPERTIES OF V2N, CR2N AND DELTA-MON
Authors: SANJINES R HONES P LEVY F
Citation: R. Sanjines et al., HEXAGONAL NITRIDE COATINGS - ELECTRONIC AND MECHANICAL-PROPERTIES OF V2N, CR2N AND DELTA-MON, Thin solid films, 332(1-2), 1998, pp. 225-229
SPUTTER-DEPOSITED CHROMIUM NITRIDE BASED TERNARY COMPOUNDS FOR HARD COATINGS
Authors: HONES P SANJINES R LEVY F
Citation: P. Hones et al., SPUTTER-DEPOSITED CHROMIUM NITRIDE BASED TERNARY COMPOUNDS FOR HARD COATINGS, Thin solid films, 332(1-2), 1998, pp. 240-246
CHEMICAL BONDING AND ELECTRONIC-STRUCTURE IN BINARY VNY AND TERNARY T1-XVXNY NITRIDES
Authors: SANJINES R WIEMER C HONES P LEVY F
Citation: R. Sanjines et al., CHEMICAL BONDING AND ELECTRONIC-STRUCTURE IN BINARY VNY AND TERNARY T1-XVXNY NITRIDES, Journal of applied physics, 83(3), 1998, pp. 1396-1402
CHARACTERIZATION OF SPUTTER-DEPOSITED CHROMIUM NITRIDE THIN-FILMS FORHARD COATINGS
Authors: HONES P SANJINES R LEVY F
Citation: P. Hones et al., CHARACTERIZATION OF SPUTTER-DEPOSITED CHROMIUM NITRIDE THIN-FILMS FORHARD COATINGS, Surface & coatings technology, 94-5(1-3), 1997, pp. 398-402
DEPOSITION AND CHARACTERIZATION OF REFRACTORY TERNARY PHASES - THE TRANSITION-METAL NITRIDE TI1-XMOXNY
Authors: WIEMER C SANJINES R LEVY F
Citation: C. Wiemer et al., DEPOSITION AND CHARACTERIZATION OF REFRACTORY TERNARY PHASES - THE TRANSITION-METAL NITRIDE TI1-XMOXNY, Surface & coatings technology, 87-8(1-3), 1996, pp. 372-376
ELECTRONIC-STRUCTURE OF AL3NI AND ALNI3 ALLOYS
Authors: KOVACS Z KOVER L WEIGHTMAN P VARGA D SANJINES R PALINKAS J MARGARITONDO G ADACHI H
Citation: Z. Kovacs et al., ELECTRONIC-STRUCTURE OF AL3NI AND ALNI3 ALLOYS, Physical review. B, Condensed matter, 54(12), 1996, pp. 8501-8505
VALENCE-BAND PHOTOEMISSION-STUDY OF THE TI-MO-N SYSTEM
Authors: SANJINES R WIEMER C ALMEIDA J LEVY F
Citation: R. Sanjines et al., VALENCE-BAND PHOTOEMISSION-STUDY OF THE TI-MO-N SYSTEM, Thin solid films, 291, 1996, pp. 334-338
CHEMICAL-STATE ANALYSIS OF SURFACE AND INTERFACE SEGREGATES IN COEVAPORATED AL-SN-O SYSTEMS
Authors: KOVER L BARNA PB SANJINES R KOVACS Z MARGARITONDO G ADAMIK M RADI Z
Citation: L. Kover et al., CHEMICAL-STATE ANALYSIS OF SURFACE AND INTERFACE SEGREGATES IN COEVAPORATED AL-SN-O SYSTEMS, Thin solid films, 282(1-2), 1996, pp. 90-93
NANOSCOPIC TRIGONAL PYRAMIDAL CRYSTALLITES IN WS2-X SPUTTERED THIN-FILMS - A SCANNING-TUNNELING-MICROSCOPY STUDY OF INITIAL GROWTH
Authors: BALLIF C REGULA M REMSKAR M SANJINES R LEVY F
Citation: C. Ballif et al., NANOSCOPIC TRIGONAL PYRAMIDAL CRYSTALLITES IN WS2-X SPUTTERED THIN-FILMS - A SCANNING-TUNNELING-MICROSCOPY STUDY OF INITIAL GROWTH, Surface science, 366(2), 1996, pp. 703-708
MOS2 AS MICROTUBES
Authors: REMSKAR M SKRABA Z CLETON F SANJINES R LEVY F
Citation: M. Remskar et al., MOS2 AS MICROTUBES, Applied physics letters, 69(3), 1996, pp. 351-353
TIO2 ANATASE THIN-FILMS AS GAS SENSORS
Authors: TANG H PRASAD K SANJINES R LEVY F
Citation: H. Tang et al., TIO2 ANATASE THIN-FILMS AS GAS SENSORS, Sensors and actuators. B, Chemical, 26(1-3), 1995, pp. 71-75
HIGH-RESOLUTION PHOTOEMISSION AND AUGER PARAMETER STUDIES OF ELECTRONIC-STRUCTURE OF TIN OXIDES
Authors: KOVER L MORETTI G KOVACS Z SANJINES R CSEMY I MARGARITONDO G PALINKAS J ADACHI H
Citation: L. Kover et al., HIGH-RESOLUTION PHOTOEMISSION AND AUGER PARAMETER STUDIES OF ELECTRONIC-STRUCTURE OF TIN OXIDES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 1382-1388
MORPHOLOGICAL EFFECTS IN THE QUANTUM YIELD OF CESIUM IODIDE
Authors: ALMEIDA J BARBO F BERTOLO M BIANCO A BRAEM A CERASARI S COLUZZA C DELLORTO T FONTANA S MARGARITONDO G NAPPI E PAIC G PIUZ F SANJINES R SCOGNETTI T SGOBBA S
Citation: J. Almeida et al., MORPHOLOGICAL EFFECTS IN THE QUANTUM YIELD OF CESIUM IODIDE, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 361(3), 1995, pp. 524-538
ELECTRONIC-STRUCTURE OF TIN OXIDES - HIGH-RESOLUTION STUDY OF XPS ANDAUGER-SPECTRA
Authors: KOVER L KOVACS Z SANJINES R MORETTI G CSERNY I MARGARITONDO G PALINKAS J ADACHI H
Citation: L. Kover et al., ELECTRONIC-STRUCTURE OF TIN OXIDES - HIGH-RESOLUTION STUDY OF XPS ANDAUGER-SPECTRA, Surface and interface analysis, 23(7-8), 1995, pp. 461-466
REALISTIC CLUSTER APPROACH FOR INTERPRETING THE VALENCE-BAND STRUCTURE OF PHOSPHORUS OXYANIONS
Authors: CSERNY I KOVER L NEMETHY A ADACHI H TANAKA I SANJINES R COLUZZA C MARGARITONDO G
Citation: I. Cserny et al., REALISTIC CLUSTER APPROACH FOR INTERPRETING THE VALENCE-BAND STRUCTURE OF PHOSPHORUS OXYANIONS, Surface and interface analysis, 23(7-8), 1995, pp. 477-483
STRUCTURAL AND MORPHOLOGICAL CHARACTERIZATION OF NB2O5 THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING
Authors: ROSENFELD D SANJINES R LEVY F BUFFAT PA DEMARNE V GRISEL A
Citation: D. Rosenfeld et al., STRUCTURAL AND MORPHOLOGICAL CHARACTERIZATION OF NB2O5 THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 135-139
ESCA INVESTIGATION OF SNOX FILMS USED AS GAS SENSORS
Authors: SANJINES R ROSENFELD D GOZZO F ALMERAS P PEREZ L LEVY F MARGARITONDO G SCHREINER WH
Citation: R. Sanjines et al., ESCA INVESTIGATION OF SNOX FILMS USED AS GAS SENSORS, Surface and interface analysis, 22(1-12), 1994, pp. 372-375
ELECTRONIC-STRUCTURE OF ANATASE TIO2 OXIDE
Authors: SANJINES R TANG H BERGER H GOZZO F MARGARITONDO G LEVY F
Citation: R. Sanjines et al., ELECTRONIC-STRUCTURE OF ANATASE TIO2 OXIDE, Journal of applied physics, 75(6), 1994, pp. 2945-2951
ELECTRICAL AND OPTICAL-PROPERTIES OF TIO2 ANATASE THIN-FILMS
Authors: TANG H PRASAD K SANJINES R SCHMID PE LEVY F
Citation: H. Tang et al., ELECTRICAL AND OPTICAL-PROPERTIES OF TIO2 ANATASE THIN-FILMS, Journal of applied physics, 75(4), 1994, pp. 2042-2047
GAS SENSITIVE AND SELECTIVE SNO2 THIN POLYCRYSTALLINE FILMS DOPED BY ION-IMPLANTATION
Authors: ROSENFELD D SANJINES R SCHREINER WH LEVY F
Citation: D. Rosenfeld et al., GAS SENSITIVE AND SELECTIVE SNO2 THIN POLYCRYSTALLINE FILMS DOPED BY ION-IMPLANTATION, Sensors and actuators. B, Chemical, 16(1-3), 1993, pp. 406-409
NEW FRONTIERS IN SURFACE AND INTERFACE INSTRUMENTATION - SPECTROMICROSCOPY, ULTRABRIGHT SYNCHROTRON-RADIATION, FREE-ELECTRON LASERS
Authors: MARGARITONDO G COLUZZA C SANJINES R SCHMID PE STAEHLI JL TUNCEL E
Citation: G. Margaritondo et al., NEW FRONTIERS IN SURFACE AND INTERFACE INSTRUMENTATION - SPECTROMICROSCOPY, ULTRABRIGHT SYNCHROTRON-RADIATION, FREE-ELECTRON LASERS, Analusis, 21(8), 1993, pp. 130000025-130000027
(TIALV)N(1-X)THIN FILMS DEPOSITED BY REACTIVE SPUTTERING - CHEMICAL-COMPOSITION
Authors: ASTURIZAGA O SANJINES R MARGARITONDO G LEVY F
Citation: O. Asturizaga et al., (TIALV)N(1-X)THIN FILMS DEPOSITED BY REACTIVE SPUTTERING - CHEMICAL-COMPOSITION, Surface & coatings technology, 61(1-3), 1993, pp. 30-35
Risultati: 1-25 | 26-26