Authors: WONGLEUNG J EAGLESHAM DJ SAPJETA J JACOBSON DC POATE JM WILLIAMS JS

Citation: J. Wongleung et al., THE PRECIPITATION OF FE AT THE SI-SIO2 INTERFACE, Journal of applied physics, 83(1), 1998, pp. 580-584

Authors: WELDON MK MARSICO VE CHABAL YJ AGARWAL A EAGLESHAM DJ SAPJETA J BROWN WL JACOBSON DC CAUDANO Y CHRISTMAN SB CHABAN EE

Citation: Mk. Weldon et al., ON THE MECHANISM OF THE HYDROGEN-INDUCED EXFOLIATION OF SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 1065-1073

Authors: MA Y GREEN ML FELDMAN LC SAPJETA J HANSON KJ WEIDMAN TW

Citation: Y. Ma et al., VAPOR-PHASE SIO2 ETCHING AND METALLIC CONTAMINATION REMOVAL IN AN INTEGRATED CLUSTER SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1460-1465

Authors: LAW HH SAPJETA J SPROLES ES

Citation: Hh. Law et al., PROTECTIVE TREATMENTS FOR GOLD-FLASHED CONTACT FINISHES WITH A NICKELSUBSTRATE, IEEE transactions on components, packaging, and manufacturing technology. Part A, 18(2), 1995, pp. 405-408

Authors: COMIZZOLI RB FRANKENTHAL RP HANSON KJ KONSTADINIDIS K OPILA RL SAPJETA J SINCLAIR JD TAKAHASHI KM FRANK AL IBIDUNNI AO

Citation: Rb. Comizzoli et al., ELECTROCHEMICAL ASPECTS OF CORROSION-RESISTANCE AND ETCHING OF METALLIZATIONS FOR MICROELECTRONICS, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 198(1-2), 1995, pp. 153-160

Authors: LAW HH SAPJETA J CHIDSEY CED PUTVINSKI TM

Citation: Hh. Law et al., PROTECTIVE TREATMENTS FOR NICKEL-BASED CONTACT MATERIALS, Journal of the Electrochemical Society, 141(7), 1994, pp. 1977-1982