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Results: 1-11 |
Results: 11
DIAMOND NUCLEATION ENHANCEMENT BY PRETREATING THE SILICON SUBSTRATE WITH A FLUOROCARBON PLASMA
Authors: SCHELZ S MARTINU L MOISAN M
Citation: S. Schelz et al., DIAMOND NUCLEATION ENHANCEMENT BY PRETREATING THE SILICON SUBSTRATE WITH A FLUOROCARBON PLASMA, DIAMOND AND RELATED MATERIALS, 7(9), 1998, pp. 1291-1302
DIAMOND NUCLEATION ENHANCEMENT BY HYDROFLUORIC-ACID ETCHING OF SILICON SUBSTRATE
Authors: SCHELZ S BORGES CFM MARTINU L MOISAN M
Citation: S. Schelz et al., DIAMOND NUCLEATION ENHANCEMENT BY HYDROFLUORIC-ACID ETCHING OF SILICON SUBSTRATE, DIAMOND AND RELATED MATERIALS, 6(2-4), 1997, pp. 440-443
CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FILMS ON HYDROFLUORIC-ACID ETCHED SILICON SUBSTRATES
Authors: SCHELZ S BORGES CFM MARTINU L MOISAN M
Citation: S. Schelz et al., CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FILMS ON HYDROFLUORIC-ACID ETCHED SILICON SUBSTRATES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(5), 1997, pp. 2743-2749
ADHESION OF CVD DIAMOND FILMS ON SILICON SUBSTRATES OF DIFFERENT CRYSTALLOGRAPHIC ORIENTATIONS
Authors: BORGES CFM SCHELZ S MARTINU L MOISAN M
Citation: Cfm. Borges et al., ADHESION OF CVD DIAMOND FILMS ON SILICON SUBSTRATES OF DIFFERENT CRYSTALLOGRAPHIC ORIENTATIONS, DIAMOND AND RELATED MATERIALS, 5(12), 1996, pp. 1402-1406
ELECTRONIC AND ATOMIC-STRUCTURE OF EVAPORATED CARBON-FILMS
Authors: SCHELZ S RICHMOND T KANIA P OELHAFEN P GUNTHERODT HJ
Citation: S. Schelz et al., ELECTRONIC AND ATOMIC-STRUCTURE OF EVAPORATED CARBON-FILMS, Surface science, 359(1-3), 1996, pp. 227-236
VERY LOW-ROUGHNESS DIAMOND FILM DEPOSITION USING A SURFACE-WAVE-SUSTAINED PLASMA
Authors: BORGES CFM AIROLDI VT CORAT EJ MOISAN M SCHELZ S GUAY D
Citation: Cfm. Borges et al., VERY LOW-ROUGHNESS DIAMOND FILM DEPOSITION USING A SURFACE-WAVE-SUSTAINED PLASMA, Journal of applied physics, 80(10), 1996, pp. 6013-6020
SILICON CONTAMINATION OF DIAMOND FILMS DEPOSITED ON SILICON SUBSTRATES IN FUSED-SILICA BASED REACTORS
Authors: BORGES CFM SCHELZ S STONGE L MOISAN M MARTINU L
Citation: Cfm. Borges et al., SILICON CONTAMINATION OF DIAMOND FILMS DEPOSITED ON SILICON SUBSTRATES IN FUSED-SILICA BASED REACTORS, Journal of applied physics, 79(6), 1996, pp. 3290-3298
SURFACE STUDY OF PLASMA-POLYMERIZED AND UV-POLYMERIZED STYRENE FILMS USING SCANNING FORCE MICROSCOPY AND IN-SITU PHOTOELECTRON-SPECTROSCOPY
Authors: SCHELZ S SCHUHLER N RICHMOND T OELHAFEN P
Citation: S. Schelz et al., SURFACE STUDY OF PLASMA-POLYMERIZED AND UV-POLYMERIZED STYRENE FILMS USING SCANNING FORCE MICROSCOPY AND IN-SITU PHOTOELECTRON-SPECTROSCOPY, Thin solid films, 266(2), 1995, pp. 133-139
INVESTIGATION ABOUT THE INCORPORATION OF HYDROGEN INTO AMORPHOUS-CARBON
Authors: SCHELZ S KANIA P FRAUENHEIM T STEPHAN U OELHAFEN P
Citation: S. Schelz et al., INVESTIGATION ABOUT THE INCORPORATION OF HYDROGEN INTO AMORPHOUS-CARBON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(5), 1994, pp. 2820-2824
IN-SITU METALLIZATION OF POLYSTYRENE - A PES STUDY OF THE INTERFACE PROPERTIES
Authors: SCHUHLER N SCHELZ S OELHAFEN P
Citation: N. Schuhler et al., IN-SITU METALLIZATION OF POLYSTYRENE - A PES STUDY OF THE INTERFACE PROPERTIES, Surface science, 311(1-2), 1994, pp. 189-195
A MONOLAYER INTERFACE OF PLASMA-POLYMERIZED POLYSTYRENE ON NIOBIUM - AN IN-SITU ELECTRON-SPECTROSCOPY STUDY
Authors: SCHELZ S REINKE P OELHAFEN P
Citation: S. Schelz et al., A MONOLAYER INTERFACE OF PLASMA-POLYMERIZED POLYSTYRENE ON NIOBIUM - AN IN-SITU ELECTRON-SPECTROSCOPY STUDY, Surface science, 293(3), 1993, pp. 275-282
Risultati: 1-11 |