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Citation: Jj. Scholtz et al., DESCRIPTION OF THE INFLUENCE OF CHARGING ON THE MEASUREMENT OF THE SECONDARY-ELECTRON YIELD OF MGO, Applied surface science, 111, 1997, pp. 259-264

Authors: HOPMAN HJ VERHOEVEN J SCHOLTZ JJ FASTENAU R

Citation: Hj. Hopman et al., TIME-VARIATION OF SECONDARY-ELECTRON EMISSION DURING ELECTRON-BOMBARDMENT OF RUTILE, Applied surface science, 111, 1997, pp. 270-275

Authors: BALKENENDE AR BOGAERTS AAMB SCHOLTZ JJ TIJBURG RRM WILLEMS HX

Citation: Ar. Balkenende et al., THIN MGO LAYERS FOR EFFECTIVE HOPPING TRANSPORT OF ELECTRONS, Philips journal of research, 50(3-4), 1996, pp. 365-373

Authors: SCHOLTZ JJ DIJKKAMP D SCHMITZ RWA

Citation: Jj. Scholtz et al., SECONDARY-ELECTRON EMISSION PROPERTIES, Philips journal of research, 50(3-4), 1996, pp. 375-389