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Authors: GURARY AI THOMPSON AG STALL RA KROLL WJ SCHUMAKER NE

Citation: Ai. Gurary et al., INVESTIGATION OF THE WAFER TEMPERATURE UNIFORMITY IN AN OMVPE VERTICAL ROTATING-DISK REACTOR, Journal of electronic materials, 24(11), 1995, pp. 1637-1640

Authors: GURARY AI TOMPA GS THOMPSON AG STALL RA ZAWADZKI PA SCHUMAKER NE

Citation: Ai. Gurary et al., THERMAL AND FLOW ISSUES IN THE DESIGN OF METALORGANIC CHEMICAL-VAPOR-DEPOSITION REACTORS, Journal of crystal growth, 145(1-4), 1994, pp. 642-649