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FABRICATION AND CHARACTERIZATION OF METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS USING SPUTTERED SILICON-NITRIDE FILM AS A GATE DIELECTRIC
Authors:
SUNDARAM KB SESHAN SS
Citation:
Kb. Sundaram et Ss. Seshan, FABRICATION AND CHARACTERIZATION OF METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS USING SPUTTERED SILICON-NITRIDE FILM AS A GATE DIELECTRIC, International journal of electronics, 77(1), 1994, pp. 61-69
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