Authors: SHIH KK DOVE DB

Citation: Kk. Shih et Db. Dove, THIN-FILM MATERIALS FOR THE PREPARATION OF ATTENUATING PHASE-SHIFT MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 32-36

Authors: SHIH KK DOVE DB

Citation: Kk. Shih et Db. Dove, DEPOSITION OF ALUMINUM-OXIDE FILMS WITH HIGH REFRACTIVE-INDEX, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 321-322

Authors: SHIH KK CHIEU TC DOVE DB

Citation: Kk. Shih et al., HAFNIUM DIOXIDE ETCH-STOP LAYER FOR PHASE-SHIFTING MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2130-2131

Authors: SHIH KK KARASINSKI J

Citation: Kk. Shih et J. Karasinski, PROPERTIES OF CO-N, CO-FE-N, AND CO-ZR-N FILMS PREPARED BY RF-SPUTTERING IN NITROGEN-ARGON GAS-MIXTURES, Journal of applied physics, 73(12), 1993, pp. 8377-8380