Authors: LEE JH SHIM CM PARK SK JUNG DG PARK S

Citation: Jh. Lee et al., A POSSIBLE METHOD FOR LARGE-AREA DEPOSIT ION OF A-SI-H THIN-FILMS USING ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 295(1-2), 1997, pp. 67-72