Authors: SHUM DP TSENG HH PAULSON WM CHANG KM TOBIN PJ

Citation: Dp. Shum et al., A HIGHLY ROBUST PROCESS INTEGRATION WITH SCALED ONO INTERPOLY DIELECTRICS FOR EMBEDDED NONVOLATILE MEMORY APPLICATIONS, I.E.E.E. transactions on electron devices, 42(7), 1995, pp. 1376-1377