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Citation: C. Hollenstein et al., SILICON-OXIDE PARTICLE FORMATION IN RF PLASMAS INVESTIGATED BY INFRARED-ABSORPTION SPECTROSCOPY AND MASS-SPECTROMETRY, Journal of physics. D, Applied physics, 31(1), 1998, pp. 74-84

Authors: SIMONS N

Citation: N. Simons, CONCERNING THE NEW MAGAZINE POLICY REQUIRING QUANTITATIVE ACCURACY STATEMENTS, IEEE antennas & propagation magazine, 36(6), 1994, pp. 86-86