Authors:
BRUENGER WH
BUCHMANN LM
TORKLER M
SINKWITZ S
Citation: Wh. Bruenger et al., HPR-506 PHOTORESIST USED AS A POSITIVE TONE ION RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3924-3927