This paper shows a detailed investigation about organic contaminant ab
sorption in conventional resist. It describes different effects depend
ing on contamination type and the status of processing. Combination of
organic contamination and resist bake leads to profile deformation re
sulting in a ''bottle profile''. These observations demonstrate ambien
t organic contamination is not only limited to chemically amplified De
ep UV resists but also affect g/i-line resists.