Citation: Hh. Richter et al., OPTICAL-EMISSION END-POINT DETECTION FOR REACTIVE ION ETCHING OF SI SIGE STRUCTURES/, Materials science & engineering. B, Solid-state materials for advanced technology, 27(1), 1994, pp. 39-45
Citation: Hh. Richter et al., OPTICAL-EMISSION END-POINT DETECTION FOR REACTIVE ION ETCHING OF SI SIGE STRUCTURES/, Materials science & engineering. B, Solid-state materials for advanced technology, 27(1), 1994, pp. 39-45