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Results:
1-8
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Results: 8
Authors:
SCHULTE J
SOBE G
Citation: J. Schulte et G. Sobe, MAGNETRON SPUTTERING OF ALUMINUM USING OXYGEN OR NITROGEN AS REACTIVEGAS, Thin solid films, 324(1-2), 1998, pp. 19-24
Authors:
SCHULTE J
SOBE G
REISS G
Citation: J. Schulte et al., A LINEAR-MODEL FOR THE INTERPRETATION OF OPTICAL-EMISSION SPECTROSCOPY MEASUREMENTS IN LOW-PRESSURE DC MAGNETRON SPUTTERING, Contributions to Plasma Physics, 37(6), 1997, pp. 483-497
Authors:
SCHULTE J
SOBE G
Citation: J. Schulte et G. Sobe, INVESTIGATION OF THE MECHANISMS OF MAGNETRON SPUTTERING OF ALUMINUM WITH MIXTURES OF ARGON AND NITROGEN IN THE PARTIALLY REACTIVE MODE, Surface & coatings technology, 97(1-3), 1997, pp. 510-515
Authors:
SOBE G
Citation: G. Sobe, PARTIALLY REACTIVE DC MAGNETRON SPUTTERING - A KEY TO NEW UNDERSTANDING OF REACTIVE PLASMA SPUTTER-DEPOSITION, Surface & coatings technology, 74-5(1-3), 1995, pp. 80-84
Authors:
BRUCKNER W
SOBE G
GRIESSMANN H
BAUNACK S
REISS G
Citation: W. Bruckner et al., MECHANICAL-STRESS AND ELECTRICAL-RESISTANCE OF CRSI-O THIN-FILMS, Thin solid films, 261(1-2), 1995, pp. 90-97
Authors:
SOBE G
Citation: G. Sobe, TO THE KINETICS OF NITROGEN INCORPORATION DURING DC MAGNETRON DEPOSITION, Contributions to Plasma Physics, 34(1), 1994, pp. 81-97
Authors:
SOBE G
SCHREIBER H
WEISE G
HEINRICH A
Citation: G. Sobe et al., ON THE CAUSES AND EFFECTS OF CONTAMINATIONS DURING RF DIODE DEPOSITION OF CR-SI ALLOYS, Contributions to Plasma Physics, 33(4), 1993, pp. 325-335
Authors:
NEELMEIJER C
SOBE G
Citation: C. Neelmeijer et G. Sobe, HYDROGEN ANALYSIS IN CRSIO THIN-FILMS, Journal of radioanalytical and nuclear chemistry, 175(5), 1993, pp. 389-392
Risultati:
1-8
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