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Results:
1-8
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Results: 8
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, PRACTICAL PROCESSING ISSUES IN TITANIUM SILICIDE CVD, Applied surface science, 119(1-2), 1997, pp. 41-49
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, KINETICS OF TISI2 FORMATION AND SILICON CONSUMPTION DURING CHEMICAL-VAPOR-DEPOSITION, Journal of the Electrochemical Society, 144(6), 1997, pp. 2122-2137
Authors:
SOUTHWELL RP
MENDICINO MA
SEEBAUER EG
Citation: Rp. Southwell et al., OPTIMIZATION OF SELECTIVE TISI2 CHEMICAL-VAPOR-DEPOSITION BY MECHANISTIC CHEMICAL-KINETICS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 928-934
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, A PREDICTIVE KINETIC-MODEL FOR THE CHEMICAL-VAPOR-DEPOSITION OF TISI2, Journal of the Electrochemical Society, 143(5), 1996, pp. 1726-1736
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, ADSORPTION OF TICL4 ON TISI2 - APPLICATION TO SILICIDE CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(2), 1995, pp. 221-229
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, DIFFERENTIAL-CONVERSION TEMPERATURE-PROGRAMMED DESORPTION - A NEW METHOD FOR OBTAINING BIMOLECULAR SURFACE RATE CONSTANTS, Surface science, 340(3), 1995, pp. 281-292
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, SIH4 ON TISI2 - AN INVESTIGATION OF GAS-ADSORPTION ON METAL-LIKE COMPOUNDS, Surface science, 329(1-2), 1995, pp. 107-114
Authors:
MENDICINO MA
SOUTHWELL RP
SEEBAUER EG
Citation: Ma. Mendicino et al., CHEMICAL-VAPOR-DEPOSITION OF TISI2 USING SIH4 AND TICL4, Thin solid films, 253(1-2), 1994, pp. 473-478
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