Authors:
HUDEK P
KOSTIC I
BELOV M
RANGELOW IW
SHI F
PAWLOWSKI G
SPIESS W
BUSCHBECK H
CEKAN E
EDER S
LOSCHNER H
Citation: P. Hudek et al., DEEP-ULTRAVIOLET RESISTS AZ DX-561 AND AZ DX-1300P APPLIED FOR ELECTRON-BEAM AND MASKED ION-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2550-2554