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Analysis of the negative ion characteristics of O-2 supermagnetron plasma for submicron etching use
Authors:
Kinoshita, H Honda, M Tatsuta, T Sakiya, F
Citation:
H. Kinoshita et al., Analysis of the negative ion characteristics of O-2 supermagnetron plasma for submicron etching use, VACUUM, 55(3-4), 1999, pp. 219-222
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