Authors: Vazquez, L Ojeda, F Cuerno, R Salvarezza, R Albella, JM

Citation: L. Vazquez et al., Modelling of silica film growth by chemical vapour deposition: Influence of the interface properties, J PHYS IV, 11(PR3), 2001, pp. 129-140

Authors: Ojeda, F Cuerno, R Salvarezza, R Vazquez, L

Citation: F. Ojeda et al., Dynamics of rough interfaces in chemical vapor deposition: Experiments anda model for silica films, PHYS REV L, 84(14), 2000, pp. 3125-3128

Authors: Ojeda, F Cuerno, R Salvarezza, R Vazquez, L

Citation: F. Ojeda et al., Study of the growth mechanisms of low-pressure chemically vapour depositedsilica films, J PHYS IV, 9(P8), 1999, pp. 265-271