Authors: Belogorokhov, AI Bublik, VT Scherbachev, KD Parkhomenko, YN Makarov, VV Danilin, AB

Citation: Ai. Belogorokhov et al., Behaviour of implanted oxygen and nitrogen in halogen lamp annealed silicon, NUCL INST B, 147(1-4), 1999, pp. 320-326