Authors: Hattori, T Semura, S Akasaka, N

Citation: T. Hattori et al., Inductively coupled plasma-enhanced chemical vapor deposition of SiO2 and GeO2-SiO2 films for optical waveguides using tetraethylorthosilicate and tetramethylgermanium, JPN J A P 1, 38(5A), 1999, pp. 2775-2778