Authors:
Peng, TY
Chang, G
Sheng, XH
Jiang, ZC
Hu, B
Citation: Ty. Peng et al., Electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry for the direct determination of trace amounts of impurities in slurries of silicon carbide, ANALYT CHIM, 433(2), 2001, pp. 255-262