Authors:
Ohshima, T
Yoshida, M
Shigemasa, R
Tsunotani, M
Kimura, T
Citation: T. Ohshima et al., Gate orientation dependence of InGaAs/AlGaAs high electron mobility transistors formed by wet recess etching, JPN J A P 1, 39(9A), 2000, pp. 5052-5056
Authors:
Ohshima, T
Moriguchi, H
Shigemasa, R
Goto, S
Tsunotani, M
Kimura, T
Citation: T. Ohshima et al., Schottky characteristics of InAlAs grown by metal-organic chemical vapor deposition, JPN J A P 1, 38(2B), 1999, pp. 1161-1163
Authors:
Ohshima, T
Shigemasa, R
Sato, M
Tsunotani, M
Kimura, T
Citation: T. Ohshima et al., Improvement of 0.1 mu m-gate InGaAs/AlGaAs HEMT performance by suppressionof electro-chemical etching in deionized water, SOL ST ELEC, 43(8), 1999, pp. 1519-1526