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Results: 1-10 |
Results: 10
Probing aspects of nonlinear conduction in electrorheological suspensions
Authors: Rankin, PJ Shkel, YM Klingenberg, DJ Shohet, JL
Citation: Pj. Rankin et al., Probing aspects of nonlinear conduction in electrorheological suspensions, INT J MOD B, 15(6-7), 2001, pp. 965-972
In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation
Authors: Cismaru, C Shohet, JL
Citation: C. Cismaru et Jl. Shohet, In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation, J APPL PHYS, 88(4), 2000, pp. 1742-1746
Depletion of charge produced during plasma exposure in aluminum oxide by vacuum ultraviolet radiation
Authors: Cismaru, C Shohet, JL Lauer, JL Hansen, RW Ostapenko, S
Citation: C. Cismaru et al., Depletion of charge produced during plasma exposure in aluminum oxide by vacuum ultraviolet radiation, APPL PHYS L, 77(24), 2000, pp. 3914-3916
Synchrotron radiation-induced surface-conductivity of SiO2 for modification of plasma charging
Authors: Cismaru, C Shohet, JL McVittie, JP
Citation: C. Cismaru et al., Synchrotron radiation-induced surface-conductivity of SiO2 for modification of plasma charging, APPL PHYS L, 76(16), 2000, pp. 2191-2193
An investigation of the effects of iron in p(+)n silicon diodes for simulated plasma source ion implantation studies
Authors: Brown, KM Shohet, JL Booske, JH Gearhart, SS Liu, HL Snodgrass, TG Speth, RR
Citation: Km. Brown et al., An investigation of the effects of iron in p(+)n silicon diodes for simulated plasma source ion implantation studies, IEEE SEMIC, 12(4), 1999, pp. 452-456
A helically symmetric stellarator (HSX)
Authors: Almagri, AF Anderson, DT Anderson, FSB Probert, PH Shohet, JL Talmadge, JN
Citation: Af. Almagri et al., A helically symmetric stellarator (HSX), IEEE PLAS S, 27(1), 1999, pp. 114-115
Gridless ionized metal flux fraction measurement tool for use in ionized physical vapor deposition studies
Authors: Snodgrass, TG Booske, JH Wang, W Wendt, AE Shohet, JL
Citation: Tg. Snodgrass et al., Gridless ionized metal flux fraction measurement tool for use in ionized physical vapor deposition studies, REV SCI INS, 70(2), 1999, pp. 1525-1529
Atomic absorption spectroscopic measurements of silicon atom concentrations in electron cyclotron resonance silicon oxide deposition plasmas
Authors: Augustyniak, E Chew, KH Shohet, JL Woods, RC
Citation: E. Augustyniak et al., Atomic absorption spectroscopic measurements of silicon atom concentrations in electron cyclotron resonance silicon oxide deposition plasmas, J APPL PHYS, 85(1), 1999, pp. 87-93
Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher
Authors: Cismaru, C Shohet, JL
Citation: C. Cismaru et Jl. Shohet, Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher, APPL PHYS L, 74(18), 1999, pp. 2599-2601
Effects of plasma parameters on viscosity
Authors: Dahi, H Talmadge, JN Shohet, JL
Citation: H. Dahi et al., Effects of plasma parameters on viscosity, IEEE PLAS S, 26(6), 1998, pp. 1738-1744
Risultati: 1-10 |