Authors: Jiang, ZX Backer, S Lee, JJ Wu, LY Guenther, T Sieloff, D Choi, P Foisy, M Alkemade, PFA

Citation: Zx. Jiang et al., Approach to the characterization of through-oxide boron implantation by secondary ion mass spectrometry, J VAC SCI B, 19(4), 2001, pp. 1133-1137

Authors: McKinley, JM Stevie, FA Neil, T Lee, JJ Wu, L Sieloff, D Granger, C

Citation: Jm. Mckinley et al., Depth profiling of ultra-shallow implants using a Cameca IMS-6f, J VAC SCI B, 18(1), 2000, pp. 514-518