Authors:
Ercken, M
Moelants, M
Vandenberghe, G
Goethals, M
Ronse, K
Masuda, S
Spiess, W
Pawlowski, G
Citation: M. Ercken et al., Optimization of an advanced positive tone DUV photoresist towards 150 nm and beyond, MICROEL ENG, 53(1-4), 2000, pp. 443-447