Authors:
Xu, GY
Su, X
Stagarescu, CB
Eastman, DE
Lai, B
Cai, Z
Noyan, IC
Hu, CK
Citation: Gy. Xu et al., Quantitative metrology study of Cu/SiO2 interconnect structures using fluorescence x-ray microscopy, APPL PHYS L, 78(6), 2001, pp. 820-822
Authors:
Stagarescu, CB
Duda, LC
Smith, KE
Seo, DK
Whangbo, MH
Jerome, D
Haddon, RC
Brooks, JS
Guo, JH
Nordgren, J
Citation: Cb. Stagarescu et al., Molecular components of the bulk electronic structure of organic conductors: A soft X-ray absorption and soft X-ray emission spectroscopy approach, J ELEC SPEC, 103, 1999, pp. 539-544
Authors:
Stagarescu, CB
Duda, LC
Smith, KE
Seo, DK
Whangbo, MH
Jerome, D
Haddon, RC
Brooks, JS
Guo, JH
Nordgren, J
Citation: Cb. Stagarescu et al., Electronic structure of the organic conductors kappa-ET2Cu(SCN)(2) and kappa-ET2Cu[N(CN)(2)]Br studied using soft X-ray absorption and soft X-ray emission, J SOL ST CH, 143(1), 1999, pp. 1-8