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Vitchev, RG
Lauwerens, W
Stals, L
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Celis, JP
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Celis, JP
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Cliffe, KA
Graham, IG
Scheichl, R
Stals, L
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Authors:
Vandevelde, T
Wu, TD
Quaeyhaegens, C
Vlekken, J
D'Olieslaeger, M
Stals, L
Citation: T. Vandevelde et al., Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition, THIN SOL FI, 340(1-2), 1999, pp. 159-163