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Results:
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Results: 4
Coulomb glass origin of defect-induced dielectric loss in thin-film oxides
Authors:
Fleming, RM Varma, CM Lang, DV Jones, CDW Steigerwald, ML Kowach, GR
Citation:
Rm. Fleming et al., Coulomb glass origin of defect-induced dielectric loss in thin-film oxides, APPL PHYS L, 78(25), 2001, pp. 4016-4018
Defect dominated charge transport in amorphous Ta2O5 thin films
Authors:
Fleming, RM Lang, DV Jones, CDW Steigerwald, ML Murphy, DW Alers, GB Wong, YH van Dover, RB Kwo, JR Sergent, AM
Citation:
Rm. Fleming et al., Defect dominated charge transport in amorphous Ta2O5 thin films, J APPL PHYS, 88(2), 2000, pp. 850-862
Interfacial reaction and thermal stability of Ta2O5/TiN for metal electrode capacitors
Authors:
Chang, JP Opila, RL Alers, GB Steigerwald, ML Lu, HC Garfunkel, E Gustafsson, T
Citation:
Jp. Chang et al., Interfacial reaction and thermal stability of Ta2O5/TiN for metal electrode capacitors, SOL ST TECH, 42(2), 1999, pp. 43
Thermal stability of Ta2O5 in metal-oxide-metal capacitor structures
Authors:
Chang, JP Steigerwald, ML Fleming, RM Opila, RL Alers, GB
Citation:
Jp. Chang et al., Thermal stability of Ta2O5 in metal-oxide-metal capacitor structures, APPL PHYS L, 74(24), 1999, pp. 3705-3707
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