Citation: R. Steingruber et al., Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings, MICROEL ENG, 57-8, 2001, pp. 285-289
Authors:
Stankovic, S
Dias, D
Hain, M
Bhattacharya, S
Glockner, R
Karaboue, C
Benmohammadi, L
Guessous, F
Wang, LL
Tschudi, T
Ferstl, M
Pawlowski, E
Steingruber, R
Citation: S. Stankovic et al., Integrated optical pickup system for axial dual focus, APPL OPTICS, 40(5), 2001, pp. 614-621
Authors:
Turck, V
Rodt, S
Stier, O
Heitz, R
Engelhardt, R
Pohl, UW
Bimberg, D
Steingruber, R
Citation: V. Turck et al., Effect of random field fluctuations on excitonic transitions of individualCdSe quantum dots, PHYS REV B, 61(15), 2000, pp. 9944-9947
Citation: R. Steingruber et M. Ferstl, Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique, MICROEL ENG, 53(1-4), 2000, pp. 539-542
Authors:
Steingruber, R
Trommer, D
Kaiser, R
Pfeiffer, K
Tiedke, I
Citation: R. Steingruber et al., Flexible, reliable and simple fabrication of integrated spot size converters with shifting mask technique, MICROEL ENG, 53(1-4), 2000, pp. 577-580
Authors:
Mekonnen, GG
Schlaak, W
Bach, HG
Steingruber, R
Seeger, A
Engel, T
Passenberg, W
Umbach, A
Schramm, C
Unterborsch, G
van Waasen, S
Citation: Gg. Mekonnen et al., 37-GHz bandwidth InP-based photoreceiver OEIC suitable for data rates up to 50 Gb/s, IEEE PHOTON, 11(2), 1999, pp. 257-259
Citation: S. Ullerich et al., Grey-tone lithography and dry etching technique for the fabrication of integrated spot size converters, MICROEL ENG, 46(1-4), 1999, pp. 303-306
Authors:
Umbach, A
Engel, T
Bach, HG
van Waasen, S
Droge, E
Strittmatter, A
Ebert, W
Passenberg, W
Steingruber, R
Schlaak, W
Mekonnen, GG
Unterborsch, G
Bimberg, D
Citation: A. Umbach et al., Technology of InP-based 1.55-mu m ultrafast OEMMIC's: 40-Gbit/s broad-band38/60-GHz narrow-band photoreceivers, IEEE J Q EL, 35(7), 1999, pp. 1024-1031