Authors: Rudman, DA Stork, FJB Booth, JC Juang, JY Vale, LR Beatty, GJ Williams, CI Beall, JA Ono, RH Qadri, SB Osofsky, MS Skelton, EF Claassen, JH Gibson, G MacManus-Driscoll, JL Malde, N Cohen, LF

Citation: Da. Rudman et al., Role of oxygen pressure during deposition on the microwave properties of YBCO films, IEEE APPL S, 9(2), 1999, pp. 2460-2464