Authors: Napolitani, E Carnera, A Storti, R Privitera, V Priolo, F Mannino, G Moffatt, S

Citation: E. Napolitani et al., Depth profiling of ultrashallow B implants in silicon using a magnetic-sector secondary ion mass spectrometry instrument, J VAC SCI B, 18(1), 2000, pp. 519-523