Authors: Pfeiffer, HC Dhaliwal, RS Golladay, SD Doran, SK Gordon, MS Groves, TR Kendall, RA Lieberman, JE Petric, PF Pinckney, DJ Quickle, RJ Robinson, CF Rockrohr, JD Senesi, JJ Stickel, W Tressler, EV Tanimoto, A Yamaguchi, T Okamoto, K Suzuki, K Okino, T Kawata, S Morita, K Suziki, SC Shimizu, H Kojima, S Varnell, G Novak, WT Stumbo, DP Sogard, M

Citation: Hc. Pfeiffer et al., Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J VAC SCI B, 17(6), 1999, pp. 2840-2846