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Results:
1-3
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Results: 3
Fabrication of self-aligned 90-nm fully depleted SOICMOS SLOTFETs
Authors:
Chen, CK Chen, CL Gouker, PM Wyatt, PW Yost, DR Burns, JA Suntharalingam, V Fritze, M Keast, CL
Citation:
Ck. Chen et al., Fabrication of self-aligned 90-nm fully depleted SOICMOS SLOTFETs, IEEE ELEC D, 22(7), 2001, pp. 345-347
High-frequency characterization of sub-0.25-mu m fully depleted silicon-on-insulator MOSFETs
Authors:
Chen, CL Mathews, RH Burns, JA Wyatt, PW Yost, DR Chen, CK Fritze, M Knecht, JM Suntharalingam, V Soares, A Keast, CL
Citation:
Cl. Chen et al., High-frequency characterization of sub-0.25-mu m fully depleted silicon-on-insulator MOSFETs, IEEE ELEC D, 21(10), 2000, pp. 497-499
Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits
Authors:
Fritze, M Astolfi, D Liu, H Chen, CK Suntharalingam, V Preble, D Wyatt, PW
Citation:
M. Fritze et al., Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits, J VAC SCI B, 17(2), 1999, pp. 345-349
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