Authors:
DEFORCRAND P
FUJISAKI M
HASHIMOTO T
HIOKI S
MATSUFURU H
MIYAMURA O
NAKAMURA A
OKUDA M
STAMATESCU IO
TAGO T
TAKAISHI T
Citation: P. Deforcrand et al., SPECTRAL-ANALYSIS OF MESONIC CHANNELS AT FINITE-TEMPERATURE ON ANISOTROPIC LATTICES, Nuclear physics. B, Proceedings supplement, 63, 1998, pp. 460-462
Citation: T. Tago et al., GROWTH-KINETICS OF CHEMICAL-VAPOR-DEPOSITION OF BETA-SIC FROM (CH3)(2)SICL2 AR/, Journal of the Electrochemical Society, 145(7), 1998, pp. 2516-2522
Authors:
MABUCHI K
CHINZEI T
ABE Y
IMANISHI K
ISOYAMA T
MATSUURA H
TAGO T
KOUNO A
ONO T
IMACHI K
FUJIMASA I
Citation: K. Mabuchi et al., USE OF A CATECHOLAMINE SENSOR IN THE CONTROL OF AN ARTIFICIAL-HEART SYSTEM, International journal of artificial organs, 20(1), 1997, pp. 37-42
Authors:
IGARASHI M
FUKUDA M
TAKI M
TAGO T
MINOWA T
OKADA Y
NISHIMURA J
Citation: M. Igarashi et al., PHOTOREDUCTION OF WATER BY THE SYSTEM OF C-60-PLATINUM-METHYLVIOLOGEN, Fullerene science and technology, 3(1), 1995, pp. 37-43
Citation: T. Tago et N. Hamada, EVALUATION OF THE NOISE REJECTION PERFORMANCE OF LINEAR TRAJECTORY FILTERS, IEICE transactions on fundamentals of electronics, communications and computer science, E77A(10), 1994, pp. 1710-1713
Citation: T. Tago et N. Hamada, EVALUATION OF THE NOISE REJECTION PERFORMANCE OF LINEAR TRAJECTORY FILTERS, IEICE transactions on fundamentals of electronics, communications and computer science, E77A(10), 1994, pp. 1710-1713
Authors:
KAWASE M
IKUTA Y
TAGO T
MASUDA T
HASHIMOTO K
Citation: M. Kawase et al., MODELING OF A THERMAL-GRADIENT CHEMICAL-VAPOR INFILTRATION PROCESS FOR PRODUCTION OF SILICON-CARBIDE WHISKER ALUMINA COMPOSITE, Chemical Engineering Science, 49(24A), 1994, pp. 4861-4870
Citation: T. Maruyama et T. Tago, GERMANIUM-DOPED AND SILICON-DOPED INDIUM-OXIDE THIN-FILMS PREPARED BYRADIOFREQUENCY MAGNETRON SPUTTERING, Applied physics letters, 64(11), 1994, pp. 1395-1397
Citation: T. Maruyama et T. Tago, SILICON DIOXIDE THIN-FILMS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITIONFROM SILICON TETRAACETATE, Thin solid films, 232(2), 1993, pp. 201-203
Citation: T. Maruyama et T. Tago, NICKEL THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION FROM NICKEL ACETYLACETONATE, Journal of Materials Science, 28(19), 1993, pp. 5345-5348