Authors: CRESSWELL MW SNIEGOWSKI JJ GHOSHTAGORE RN ALLEN RA GUTHRIE WF GURNELL AW LINHOLM LW DIXSON RG TEAGUE EC

Citation: Mw. Cresswell et al., RECENT DEVELOPMENTS IN ELECTRICAL LINEWIDTH AND OVERLAY METROLOGY FORINTEGRATED-CIRCUIT FABRICATION PROCESSES, JPN J A P 1, 35(12B), 1996, pp. 6597-6609

Authors: CRESSWELL MW ALLEN RA LINHOLM LW ELLENWOOD CH PENZES WB TEAGUE EC

Citation: Mw. Cresswell et al., NEW TEST STRUCTURE FOR NANOMETER-LEVEL OVERLAY AND FEATURE-PLACEMENT METROLOGY, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 266-271

Authors: OLDHAM NM KRAMAR JA HETRICK PS TEAGUE EC

Citation: Nm. Oldham et al., ELECTRONIC LIMITATIONS IN PHASE METERS FOR HETERODYNE INTERFEROMETRY, Precision engineering, 15(3), 1993, pp. 173-179