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Results:
1-7
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Results: 7
Authors:
TOMPKINS HG
ZHU T
CHEN E
Citation: Hg. Tompkins et al., DETERMINING THICKNESS OF THIN METAL-FILMS WITH SPECTROSCOPIC ELLIPSOMETRY FOR APPLICATIONS IN MAGNETIC RANDOM-ACCESS MEMORY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1297-1302
Authors:
DAUKSHER WJ
RESNICK DJ
SMITH SM
PENDHARKAR SV
TOMPKINS HG
CUMMINGS KD
SEESE PA
MANGAT PJS
CHAN JA
Citation: Wj. Dauksher et al., UNIFORM LOW-STRESS OXYNITRIDE FILMS FOR APPLICATION AS HARDMASKS ON X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2232-2237
Authors:
TOMPKINS HG
WILLIAMS PH
Citation: Hg. Tompkins et Ph. Williams, 5 LAYER STACK OF NITRIDE, OXIDE, AND AMORPHOUS-SILICON ON GLASS, ANALYZED WITH SPECTROSCOPIC ELLIPSOMETRY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 992-997
Authors:
TOMPKINS HG
SEDDON K
GARLING LK
FEJES P
Citation: Hg. Tompkins et al., CONTROLLED CRYSTALLIZATION OF LPCVD AMORPHOUS-SILICON, Thin solid films, 272(1), 1996, pp. 93-98
Authors:
TOMPKINS HG
SELLERS JA
Citation: Hg. Tompkins et Ja. Sellers, OXIDATION OF TIN IN AN OXYGEN PLASMA ASHER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 2446-2452
Authors:
TOMPKINS HG
SELLERS JA
TRACY C
Citation: Hg. Tompkins et al., AN INORGANIC ANTIREFLECTIVE COATING FOR USE IN PHOTOLITHOGRAPHY, Journal of applied physics, 73(8), 1993, pp. 3932-3938
Authors:
AJURIA SA
TOMPKINS HG
GROVE CL
CARREJO JP
Citation: Sa. Ajuria et al., INTERPRETATION OF ELLIPSOMETRY MEASUREMENTS TAKEN FROM ANNEALED HEAVILY ARSENIC-IMPLANTED SILICON, Journal of the Electrochemical Society, 140(9), 1993, pp. 2710-2714
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1-7
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