Authors: MIXON DA NOVEMBRE AE TAI WW JURGENSEN CW FRACKOVIAK J TRIMBLE LE KOLA RR CELLER GK

Citation: Da. Mixon et al., PATTERNING OF X-RAY MASKS USING THE NEGATIVE-ACTING RESIST P(SI-CMS), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2834-2838

Authors: CUMMINGS KD RESNICK DJ FRACKOVIAK J KOLA RR TRIMBLE LE GRANT B SILVERMAN S HAAS L JENNINGS B

Citation: Kd. Cummings et al., STUDY OF ELECTRON-BEAM PATTERNING OF RESIST ON TUNGSTEN X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2872-2875