Citation: Js. Zhang et al., CROSS-SECTIONAL TRANSMISSION ELECTRON-MICROSCOPY STUDY OF SI SIGE HETEROJUNCTION BIPOLAR-TRANSISTOR STRUCTURE GROWN BY ULTRA-HIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION/, JPN J A P 2, 36(7B), 1997, pp. 903-905
Authors:
TAKAI M
KATAYAMA Y
LOHNER T
KINOMURA A
RYSSEL H
TSIEN PH
BURTE E
SATOU M
CHAYAHARA A
Citation: M. Takai et al., NUCLEAR MICROPROBE APPLICATION TO SEMICONDUCTOR PROCESS-DEVELOPMENT -SILICIDE FORMATION AND MULTILAYERED STRUCTURE, Radiation effects and defects in solids, 127(3-4), 1994, pp. 357-365