Authors: GOGOLIDES E YANNAKOPOULOU K TRAVERSE A NASSIOPOULOS AG TSOIS E HATZAKIS M

Citation: E. Gogolides et al., CHARACTERIZATION OF A POSITIVE-TONE WET SILYLATION PROCESS WITH THE AZ-5214(TM) PHOTORESIST, Microelectronic engineering, 25(1), 1994, pp. 75-90

Authors: GOGOLIDES E YANNAKOPOULOU K NASSIOPOULOS AG TSOIS E HATZAKIS M

Citation: E. Gogolides et al., CHARACTERIZATION OF A POSITIVE-TONE WET SILYLATION PROCESS WITH THE AZ 5214TM PHOTORESIST, Microelectronic engineering, 21(1-4), 1993, pp. 263-266