Authors:
GOGOLIDES E
YANNAKOPOULOU K
TRAVERSE A
NASSIOPOULOS AG
TSOIS E
HATZAKIS M
Citation: E. Gogolides et al., CHARACTERIZATION OF A POSITIVE-TONE WET SILYLATION PROCESS WITH THE AZ-5214(TM) PHOTORESIST, Microelectronic engineering, 25(1), 1994, pp. 75-90
Authors:
GOGOLIDES E
YANNAKOPOULOU K
NASSIOPOULOS AG
TSOIS E
HATZAKIS M
Citation: E. Gogolides et al., CHARACTERIZATION OF A POSITIVE-TONE WET SILYLATION PROCESS WITH THE AZ 5214TM PHOTORESIST, Microelectronic engineering, 21(1-4), 1993, pp. 263-266