ACNP - Italian Periodicals Catalogue

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Results: 1-11 |

Results: 11

AN X-RAY-EXPOSURE SYSTEM FOR 100-NM-ORDER SR LITHOGRAPHY

Authors: TSUYUZAKI H FUKUDA M SUZUKI M KANEKO T TAKEUCHI N KANAI M

Citation: H. Tsuyuzaki et al., AN X-RAY-EXPOSURE SYSTEM FOR 100-NM-ORDER SR LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 263-266

NEW GAP DETECTION METHOD USING 2 LASERS OPTICAL HETERODYNE INTERFERENCE FOR X-RAY-LITHOGRAPHY

Authors: SUZUKI M FUKUDA M TSUYUZAKI H

Citation: M. Suzuki et al., NEW GAP DETECTION METHOD USING 2 LASERS OPTICAL HETERODYNE INTERFERENCE FOR X-RAY-LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 291-295

ALIGNMENT ACCURACY EVALUATION OF THE X-RAY STEPPER SS-1 FOR PROCESSEDWAFERS

Authors: SUZUKI M FUKUDA M TSUYUZAKI H

Citation: M. Suzuki et al., ALIGNMENT ACCURACY EVALUATION OF THE X-RAY STEPPER SS-1 FOR PROCESSEDWAFERS, Microelectronic engineering, 35(1-4), 1997, pp. 537-540

EFFECT OF MECHANICAL VIBRATION ON PATTERNING CHARACTERISTICS IN SYNCHROTRON-RADIATION LITHOGRAPHY

Authors: FUKUDA M ENDO N TSUYUZAKI H SUZUKI M DEGUCHI K

Citation: M. Fukuda et al., EFFECT OF MECHANICAL VIBRATION ON PATTERNING CHARACTERISTICS IN SYNCHROTRON-RADIATION LITHOGRAPHY, JPN J A P 1, 35(12B), 1996, pp. 6458-6462

PATTERNING CHARACTERISTICS UNDER SMALL VIBRATIONS OF THE MASK AND WAFER IN SR LITHOGRAPHY

Authors: FUKUDA M KOYAMA N TSUYUZAKI H SUZUKI M ISHIHARA S

Citation: M. Fukuda et al., PATTERNING CHARACTERISTICS UNDER SMALL VIBRATIONS OF THE MASK AND WAFER IN SR LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 203-206

X-RAY PROJECTION LITHOGRAPHY USING A FRESNEL ZONE-PLATE

Authors: KOYAMA N TSUYUZAKI H KURODA K SHIBAYAMA A

Citation: N. Koyama et al., X-RAY PROJECTION LITHOGRAPHY USING A FRESNEL ZONE-PLATE, JPN J A P 1, 34(12B), 1995, pp. 6748-6753

A VERTICAL X-RAY STEPPER FOR SOR LITHOGRAPHY

Authors: FUKUDA M SUZUKI M KANAI M SHIBAYAMA A TSUYUZAKI H ISHIHARA S

Citation: M. Fukuda et al., A VERTICAL X-RAY STEPPER FOR SOR LITHOGRAPHY, NTT review, 7(4), 1995, pp. 33-39

COMPATIBILITY BETWEEN 2 SR STEPPERS

Authors: TSUYUZAKI H FUKUDA M SUZUKI M SHIBAYAMA A ISHIHARA S

Citation: H. Tsuyuzaki et al., COMPATIBILITY BETWEEN 2 SR STEPPERS, Microelectronic engineering, 27(1-4), 1995, pp. 291-294

OVERLAY REPEATABILITY IN MIX-AND-MATCH EXPOSURE USING THE SR STEPPER - SS-1

Authors: SHIBAYAMA A FUKUDA M SUZUKI M TSUYUZAKI H MATSUDA T ISHIHARA S

Citation: A. Shibayama et al., OVERLAY REPEATABILITY IN MIX-AND-MATCH EXPOSURE USING THE SR STEPPER - SS-1, JPN J A P 1, 33(12B), 1994, pp. 6894-6898

X-RAY MASK INSPECTION USING REPLICATED RESIST PATTERNS

Authors: SEKIMOTO M TSUYUZAKI H OKADA I SHIBAYAMA A MATSUDA T

Citation: M. Sekimoto et al., X-RAY MASK INSPECTION USING REPLICATED RESIST PATTERNS, JPN J A P 1, 33(12B), 1994, pp. 6913-6918

OVERLAY ACCURACY OF A SYNCHROTRON-RADIATION STEPPER EVALUATED BY 2-MASK DOUBLE-EXPOSURE

Authors: FUKUDA M SUZUKI M KANAI M TSUYUZAKI H SHIBAYAMA A ISHIHARA S

Citation: M. Fukuda et al., OVERLAY ACCURACY OF A SYNCHROTRON-RADIATION STEPPER EVALUATED BY 2-MASK DOUBLE-EXPOSURE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3256-3260

Risultati: 1-11 |