AN X-RAY-EXPOSURE SYSTEM FOR 100-NM-ORDER SR LITHOGRAPHY

An x-ray exposure system for 100-nm-order synchrotron radiation lithog raphy is now bring developed. We focused on improving the resolution, alignment accuracy, and beam-intensity uniformity. The key technologie s are a flat wafer chuck to enable the use of narrower gaps, high repe atability in positioning and alignment, and the use of vignetting plat es to obtain a uniform intensity. Currently, the resolution is less th an 120 nm, the alignment repeatability is less than 14 nm, the positio ning repeatability is less then 7 nm, and the intensity variation is l ess than +/-6%. This system has been installed in the SR facility at t he NTT Atsugi Research Center and is being used to conduct feasibility testing.