Authors: Aihara, K Takeno, H Hayamizu, Y Tamatsuka, M Masui, T

Citation: K. Aihara et al., Enhanced nucleation of oxide precipitates during Czochralski silicon crystal growth with nitrogen doping, J APPL PHYS, 88(6), 2000, pp. 3705-3707

Authors: Romanowski, A Rozgonyi, G Tamatsuka, M

Citation: A. Romanowski et al., Simulation of void and oxygen precipitation processes during high temperature annealing of silicon wafers, J APPL PHYS, 85(9), 1999, pp. 6408-6414