Authors: Liddle, JA Blakey, MI Bolan, K Farrow, RC Gallatin, GM Kasica, R Katsap, V Knurek, CS Li, J Mkrtchyan, M Novembre, AE Ocola, L Orphanos, PA Peabody, ML Stanton, ST Teffeau, K Waskiewicz, WK Munro, E

Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481