Authors:
Lu, XC
Shi, B
Li, LKY
Luo, JB
Chang, XR
Tian, ZZ
Mou, JI
Citation: Xc. Lu et al., Nanoindentation and microtribological behavior of Fe-N/Ti-N multilayers with different thickness of Ti-N layers, WEAR, 250, 2001, pp. 1144-1149
Citation: Yp. Zhang et al., Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition, CHIN PHYS, 9(7), 2000, pp. 545-549
Citation: Yp. Zhang et al., On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition, MAT SCI E B, 78(1), 2000, pp. 11-15
Citation: Yp. Zhang et al., Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition, SURF COAT, 127(2-3), 2000, pp. 260-265
Citation: Ys. Gu et al., Crystalline beta-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition, MAT SCI E A, 271(1-2), 1999, pp. 206-212
Citation: Jg. Ling et al., A novel method for the synthesis of a C/D-ring synthon of vitamin D derivatives from hyodeoxycholic acid, TETRAHEDR L, 40(1), 1999, pp. 131-132