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Citation: Y. Nishimoto et al., Evaluation of parameters in atmospheric-pressure chemical vapor depositionof borophosphosilicate glass using tetraethylorthosilicate and ozone, JPN J A P 2, 40(10B), 2001, pp. L1078-L1080

Authors: Tsukamoto, K Cheng, DG Komiyama, H Nishimoto, Y Tokumasu, N Maeda, K

Citation: K. Tsukamoto et al., Morphology evolution of SiO2 films deposited by tetraethylorthosilicate/O-3 atmospheric-pressure chemical vapor deposition on thermal SiO2, JPN J A P 2, 38(1AB), 1999, pp. L68-L70

Authors: Tsukamoto, K Cheng, DG Komiyama, H Nishimoto, Y Tokumasu, N Maeda, K

Citation: K. Tsukamoto et al., Tetraethylorthosilicate vapor treatment for eliminating surface sensitivity in tetraethylorthosilicate/O-3 atmospheric-pressure chemical vapor deposition, EL SOLID ST, 2(1), 1999, pp. 24-26

Authors: Cheng, DG Tsukamoto, K Komiyama, H Nishimoto, Y Tokumasu, N Maeda, K

Citation: Dg. Cheng et al., Thermal desorption spectra of SiO2 films deposited on Si and on thermal SiO2 by tetraethylorthosilicate/O-3 atmospheric-pressure chemical vapor deposition, J APPL PHYS, 85(10), 1999, pp. 7140-7145