Authors: Conley, W Dean, K Miller, D Rich, G Graffenberg, V Patel, S Lin, SH Jamieson, A Hung, R Yamada, S Pinnow, M MacDonald, S Chambers, C Osborne, B Patterson, K Somervell, M Trinque, B Tran, HV Cho, S Chiba, T Byers, J Tomas, B Shafer, G DesMarteau, D Klopp, J Frechet, J Sanders, D Grubbs, R Ober, C Korner, H Willson, CG

Citation: W. Conley et al., Developments in materials for 157nm photoresists, SOL ST TECH, 44(10), 2001, pp. 63