Authors:
Pruette, L
Karecki, S
Reif, R
Tousignant, L
Reagan, W
Kesari, S
Zazzera, L
Citation: L. Pruette et al., Evaluation of C4F8O as an alternative plasma-enhanced chemical vapor deposition chamber clean chemistry, J ELCHEM SO, 147(3), 2000, pp. 1149-1153